The physical properties of tantalum include: hard texture, high melting point, good ductility, low coefficient of thermal expansion, low vapor pressure, good cold working performance, strong resistance to liquid metal corrosion, and high dielectric constant of surface oxide film; Chemical properties include: extremely high corrosion resistance, does not react with hydrochloric acid, concentrated nitric acid, and aqua regia, but has poor alkaline resistance.
physical property
Tantalum is a metallic element with the symbol Ta, atomic number 73, and density of 16.68g/cm ³.
Tantalum has a melting point of 2980 ℃ (or 2996 ℃), making it the third most difficult metal to melt after tungsten and rhenium.
Pure tantalum has a slight blue color and excellent ductility. It can be drawn into fine wires or made into thin foils, and can be rolled into very thin (less than 0.01 millimeters) plates without intermediate annealing in a cold state.
Tantalum has a low coefficient of thermal expansion, low vapor pressure, good cold working performance, strong resistance to liquid metal corrosion, and a large dielectric constant of the surface oxide film.
chemical property
Tantalum has extremely high corrosion resistance and does not react with hydrochloric acid, concentrated nitric acid, or aqua regia under both cold and hot conditions.
The corrosion resistance of tantalum is due to the formation of a stable protective film of tantalum pentoxide (Ta2O5) on the surface.
However, at medium temperatures (about 150 ℃ or 175 ℃), only fluorine, hydrofluoric acid, sulfur trioxide (including fuming sulfuric acid), strong bases, and certain molten salts can affect tantalum. Especially in strong alkaline environments, such as a 40% concentration caustic soda solution at 110 ℃, tantalum will be rapidly dissolved.
In summary, tantalum has a wide range of applications in various fields such as electronics, metallurgy, chemical engineering, and healthcare due to its unique physical and chemical properties.