When you need reliable materials for precision thin film deposition, tantalum sputter targets deliver exceptional performance across demanding applications. Our high-purity tantalum targets offer superior coating uniformity and consistent sputtering rates for semiconductor, optical, and display manufacturing. With 99.95% minimum purity and customizable dimensions, these targets meet your specific requirements. Whether you're producing electronic chips, optical coatings, or display components, our tantalum sputter targets ensure optimal results every batch.
You'll appreciate the outstanding properties that make our targets industry-leading:
| Parameter | Specification |
|---|---|
| Grade | Ta 1, Ta 2 |
| Purity | 99.95% minimum |
| Density | 16.6 g/cm³ |
| Thickness | 4-20 mm |
| Condition | Vacuum Annealed |
| Surface Finish | Alkaline wash / Machined |
| Processing Method | CNC Milling Machinery |
| Residual Stress | ≤30 MPa |
| Uniformity Index | ≥98% |
| Hydrogen Content | ≤20 ppm |
| Surface Treatment | Bright surface |
| Certificate | ISO 9001:2015 |
| Delivery time | Normal time need 10-15 days |
| packing | wooden box |
| Features |
1. Good ductility, good machinability 2. Good plasticity3. Excellent corrosion resistance 4. High melting point, high boiling point 5. Very small coefficients of thermal expansion 6. Good capability of absorbing and releasing hydrogen 7. Good biocompatibility |
Our tantalum targets come in multiple grades to suit different application requirements:
Ta 1 Grade: Optimized for general sputtering applications with excellent cost-performance ratio.
Ta 2 Grade: Enhanced purity levels for critical semiconductor and optical applications requiring minimal contamination.
Both grades undergo rigorous quality control to ensure consistent performance and reliability.
|
Grade |
Chemical composition%, no more than |
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|
Fe |
Si |
Ni |
W |
Mo |
Ti |
Nb |
O |
C |
H |
N |
Ta |
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|
Ta1 |
0.005 |
0.005 |
0.005 |
0.005 |
0.002 |
0.002 |
0.005 |
0.02 |
0.004 |
0.002 |
0.005 |
Balance |
|
Ta2 |
0.005 |
0.005 |
0.005 |
0.005 |
0.002 |
0.002 |
0.1 |
0.03 |
0.1 |
0.002 |
0.01 |
Balance |
We utilize advanced powder metallurgy techniques to create superior targets. Our process begins with high-quality tantalum powder produced through sodium thermal reduction. The powder undergoes cold isostatic pressing at pressures exceeding 200 MPa.
Next, vacuum sintering occurs at temperatures above 2400°C in ultra-high vacuum conditions. This creates dense, uniform ingots with exceptional structural integrity.
Finally, controlled rolling and precise heat treatment optimize the target's microstructure for enhanced sputtering performance.
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Semiconductor Manufacturing: Essential for creating thin films in integrated circuits, capacitors, and resistors. Your chip production benefits from precise film thickness control and superior electrical properties.
Display Technology: Critical for LCD and OLED manufacturing, forming electrodes and barrier layers that enhance display performance and longevity.
Optical Coatings: Perfect for lens manufacturing, architectural glass, and precision optics where transmittance and durability matter most.
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
We provide fully customizable dimensions to match your sputtering equipment specifications. Standard tolerances ensure proper fit and optimal performance in magnetron sputtering systems.
Common configurations include circular, rectangular, and specialized geometries based on your specific requirements.
Every target undergoes comprehensive testing including:
Our quality system ensures consistent performance across all production batches.
We specialize in custom manufacturing to meet your exact specifications. Our experienced team works closely with you to develop targets optimized for your specific applications and equipment.
From prototype development to full-scale production, we support your project requirements with flexible manufacturing capabilities.
Products are carefully packaged in protective materials to prevent contamination and damage during transit. We ship worldwide with reliable logistics partners ensuring safe, timely delivery to your facility.
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With over 30 years of rare metal industry experience, we understand your challenges. Our location in China's "Titanium Capital" provides access to premium raw materials and skilled craftspeople.
We've successfully served customers across 50+ countries including the United States, Germany, South Korea, and Singapore. Our commitment to quality, competitive pricing, and reliable delivery makes us your ideal partner.

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Q: What backing plate options are available?
A: We offer titanium and copper backing plates with bonding strength ≥45 MPa for enhanced thermal management.
Q: What lead times should I expect?
A: Standard products ship within 1-2 weeks, while custom configurations typically require 2-3 weeks.
Q: Do you provide material certificates?
A: Yes, complete material test certificates accompany every shipment.
Ready to enhance your thin film processes? Contact our technical team today to discuss your requirements. We're here to help you select the perfect tantalum sputter targets for your applications.
Email: info@chdymetal.com
Our experts are standing by to provide technical support and competitive quotations for your project needs.
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