Looking for premium niobium sputtering target materials for your thin film deposition needs? You've come to the right place. At Shaanxi Chuanghui Daye Metal Material Co., Ltd., we specialize in manufacturing high-quality niobium targets with 99.95% purity, specifically designed for semiconductor, electronics, and advanced coating applications. Our expertly crafted targets deliver consistent performance and superior film quality for your critical sputtering processes.
Key Features and Benefits
Our advanced niobium targets offer exceptional value for your manufacturing operations:
| Parameter | Specification |
|---|---|
| Purity | ≥99.95% |
| Density | ≥8.5 g/cm³ |
| Grain Size | ≤40 μm |
| Thickness Tolerance | ±0.02 mm |
| Oxygen Content | ≤120 ppm |
| Surface Roughness | Ra ≤0.8 μm |
| RRR Value | ≥35 |
| Melting Point | 2477°C |
| Certificate | ISO9001: 2015 |
| Standard | ASTM B 392 |
| Surface | cold rolled surface / Machined surface |
| Delivery time | normal 7-15 days |
| payment term | 30%TT in advance, 70% balance before shipment |
| Grade | Standard | Diameter Range | Thickness Range |
|---|---|---|---|
| R04200 | ASTM B 392 | 5-400 mm | 0.1 mm minimum |
| R04210 | ASTM B 392 | 5-400 mm | 0.1 mm minimum |
Chemical composition
|
Material |
Main elements(%) |
Impurities (Maximum %) |
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|
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Ta |
O |
C |
H |
N |
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RO4200 |
Remainder |
0.004 |
0.004 |
0.002 |
0.005 |
0.005 |
0.002 |
0.07 |
0.015 |
0.0040 |
0.0015 |
0.003 |
|
RO4210 |
Remainder |
0.01 |
0.01 |
0.005 |
0.02 |
0.01 |
0.004 |
0.10 |
0.02 |
0.01 |
0.0015 |
0.01 |
Manufacturing Process
We employ advanced manufacturing techniques to ensure optimal target performance:
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Our niobium sputtering target serves diverse industrial applications:
Semiconductor Industry: Essential for chip manufacturing and electronic component production through physical vapor deposition processes.
Electronics Manufacturing: Perfect for LCD displays, transparent electrode layers, and conductive thin films.
Energy Sector: Ideal for solar panel production and photovoltaic cell manufacturing.
Medical Devices: Suitable for biocompatible coatings and dental implant applications.
Research & Development: Supports advanced materials research, superconductor development, and catalyst preparation.
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
We offer flexible sizing options to meet your specific requirements:
Every target undergoes rigorous quality control:
We understand that every application has unique requirements. Our engineering team works closely with you to develop customized solutions, including:
Your niobium sputtering target products are carefully packaged to ensure safe delivery:
With over 30 years of rare metal industry experience, we deliver exceptional value:

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Q: What purity levels are available?
A: We provide 99.95% purity as standard, with higher purities available upon request.
Q: Can you provide custom dimensions?
A: Yes, we manufacture targets to your exact specifications within our capability range.
Q: What's the typical lead time?
A: Standard products ship within 1-2 weeks, while custom orders may require 2-3 weeks.
Q: Do you provide technical support?
A: Absolutely! Our experienced engineers offer comprehensive application support.
Ready to enhance your thin film deposition processes? Our team is here to help you select the perfect solution for your application.
Email: info@chdymetal.com
Contact us today for detailed specifications, custom quotes, or technical consultations. We're committed to providing you with the highest quality materials and exceptional service for all your sputtering needs.
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