99.95% Niobium Sputtering Target are used as a source material for depositing niobium thin films onto substrates. The targets can be used in sputtering processes for electronics, superconducting films, optical coatings, and other applications where a niobium layer is required.
CHDY supplies niobium sputtering targets with different purities, dimensions, and configurations according to customer requirements. Standard specifications can be checked based on the target size and quantity, while custom targets can be produced according to drawings.
Niobium has good corrosion resistance and remains stable in many acidic and alkaline environments. It also has a high melting point of approximately 2,477°C, which allows niobium to be used in applications involving elevated temperatures.
Niobium can form a stable oxide layer on its surface and has good chemical stability. These characteristics make it useful in thin-film deposition as well as other applications involving demanding chemical or thermal conditions.
For sputtering targets, purity, density, microstructure, surface condition, and dimensional accuracy can affect the coating process. These requirements should therefore be confirmed according to the specific sputtering equipment and application.
| Property | Value | |
|---|---|---|
| Purity | ≥99.9% | |
| Density | 8.5g/cm³ | |
| Theoretical Density | ≥99.8% | |
| Hardness | 95-130HV | |
| Metallic Impurities | ≤150ppm | |
| Nitrogen Content | ≤40ppm | |
| Thermal Conductivity | 54W/m·K | |
| Flatness Tolerance | ≤0.05mm | |
| Standard | ASTM B365 | |
| Surface treatment | Bright surface | |
| Certificate | ISO9001:2015 | |
| Delivery time |
production time need about 10- 15 working days. |
|
| Payment terms | 30% TT in advance, 70% balance before payment. | |
Chemical composition
|
Material |
Main elements(%) |
Impurities (Maximum %) |
||||||||||
|
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Ta |
O |
C |
H |
N |
|
|
RO4200 |
Remainder |
0.004 |
0.004 |
0.002 |
0.005 |
0.005 |
0.002 |
0.07 |
0.015 |
0.0040 |
0.0015 |
0.003 |
|
RO4210 |
Remainder |
0.01 |
0.01 |
0.005 |
0.02 |
0.01 |
0.004 |
0.10 |
0.02 |
0.01 |
0.0015 |
0.01
|
Mechanical Properties
|
Grade |
Tensile strength psi(MPa), ≥ |
Yield strength δ0.2, psi (MPa),≥ |
Elongation in 1"/2" gage length, %, ≥ |
|
|
>=0.010 |
<0.010 |
|||
|
RO4200 RO4210 |
18000 (125) |
12000 (85) |
25 |
20 |
Available Grades and Materials
We supply niobium targets in industry-standard grades R04200 and R04210, manufactured according to ASTM B 392 specifications. These grades ensure consistent quality and performance across different applications. Our materials meet stringent purity requirements for semiconductor and electronic device manufacturing.
Our advanced manufacturing process combines precision machining with strict quality control. We use high-purity niobium feedstock and employ specialized techniques to achieve uniform microstructure. Cold rolling and precision machining create smooth surfaces that optimize plasma distribution during sputtering operations.
|
|
|
|
|
|
|
|
99.95% Niobium Sputtering Target are used for a range of thin-film applications, including:
Superconducting thin films
Electronic and semiconductor applications
Optical and functional coatings
Research and laboratory deposition
Thin-film devices
Other PVD and sputtering applications
The required target purity and dimensions may vary depending on the deposition method and end use.
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
| Specification | Range |
|---|---|
| Diameter | ≥5 mm |
| Thickness | 3-25 mm (standard) |
| Minimum Thickness | 0.1 mm |
| Custom Sizes | Available upon request |
Every batch undergoes comprehensive testing including purity analysis, density measurement, and surface quality inspection. We verify mechanical properties and ensure compliance with international standards. Our quality management system guarantees consistent product performance.
|
|
|
We can check customized niobium targets based on customer drawings and equipment requirements. Target diameter, thickness, shape, purity, surface condition, and other specifications can be discussed before production.
For targets requiring bonding, please provide the required backing plate material and dimensions if available. We can check the suitable production option with the factory.
Why Choose Us
With three decades of rare metal expertise, we bring unmatched knowledge to every project. Our location in China's "Titanium Capital" provides access to premium raw materials and advanced manufacturing facilities. You receive competitive pricing, on-time delivery, and dedicated customer support throughout your project lifecycle.

|
|
|
|
|
|
FAQs
Q: What purity levels are available for niobium targets?
A: We supply targets with purity levels of 99.95% and higher, suitable for most industrial applications.
Q: Can you provide custom dimensions?
A: Yes, we manufacture targets according to your specific size requirements and chamber configurations.
Q: What is the typical lead time for orders?
A: Standard products ship within 1-2 weeks, while custom orders may require 2-3 weeks depending on specifications.
Q: Do you provide technical support?
A: Our experienced team offers comprehensive technical assistance for material selection and application guidance.
CHDY supplies niobium and other rare metal products to customers in different markets. With more than 30 years of experience in the rare metal industry, we can arrange niobium sputtering targets according to different material and dimensional requirements.
If you are looking for 99.95% Niobium Sputtering Target, please send us your required purity, target size, thickness, quantity, and bonding requirements. We will check the production details and provide a quotation based on your specifications.
Email: info@chdymetal.com
Mob./what's app.: 86-18049386902
Learn about our latest products and discounts through SMS or email