99.95% tantalum target is a high-purity tantalum sputtering material used as a source material for thin-film deposition. Tantalum targets are used in electronic, semiconductor, coating, and other applications where a tantalum film is required.
The target can be supplied in different shapes and dimensions according to the sputtering equipment and application requirements. Purity, thickness, diameter, surface condition, and other specifications can be confirmed before production.
Tantalum has a high melting point, good chemical stability, and strong resistance to corrosion in many chemical environments. It also has good ductility and can be processed into different forms for industrial applications.
For sputtering applications, the purity and physical condition of the target are important factors. Target density, surface condition, dimensions, and microstructure may also need to be considered depending on the deposition process.
99.95% tantalum is suitable for applications where this level of material purity meets the customer's process requirements. Higher-purity tantalum targets can also be discussed when required.
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Product name |
high purity tantalum target |
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Application |
Electronic Light Source Part;Implantation Parts.etc |
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Purity |
99.95% Min |
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Density |
16.65g/cm3 |
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Surface |
Polished and Black |
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Size |
Φ2.0—100mm*L,customized |
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Chemical Composition |
as below lists |
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Melting point |
3400℃ |
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Packing |
Wooden box |
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Production process |
Tantalum raw material - electron beam vacuum melting - forging - polishing - inspection - delivery |
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Delivery time |
Normal time nees 7-12 working days |
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Payment term |
30%TT in advance, 70% balance payment before shipment |
chemical composition
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Grade |
Chemical Composition (≤%) |
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Ta |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Nb |
O |
C |
H |
N |
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Ta1 |
Bal. |
0.005 |
0.005 |
0.002 |
0.01 |
0.01 |
0.002 |
0.03 |
0.015 |
0.01 |
0.0015 |
0.01 |
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Ta2 |
Bal. |
0.03 |
0.02 |
0.005 |
0.04 |
0.03 |
0.005 |
0.1 |
0.02 |
0.01 |
0.0015 |
0.01 |
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TaNb3 |
Bal. |
0.03 |
0.03 |
0.005 |
0.04 |
0.03 |
0.005 |
<3.5 |
0.02 |
0.01 |
0.0015 |
0.01 |
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TaNb20 |
Bal. |
0.03 |
0.03 |
0.005 |
0.04 |
0.03 |
0.005 |
17.0-23.0 |
0.02 |
0.01 |
0.0015 |
0.01 |
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Ta2.5W |
Bal. |
0.005 |
0.005 |
0.002 |
3.0 |
0.01 |
0.002 |
0.04 |
0.015 |
0.01 |
0.0015 |
0.01 |
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Ta10W |
Bal. |
0.005 |
0.005 |
0.002 |
11 |
0.01 |
0.002 |
0.04 |
0.015 |
0.01 |
0.0015 |
0.01 |
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We offer premium tantalum targets in multiple grades to match your specific requirements:
All grades undergo vacuum annealing treatment for optimal internal structure and performance consistency.
The tantalum targets are produced using a powder metallurgy process. High-purity tantalum powder is first compacted to form the required billet or ingot.
Cold isostatic pressing can be used to improve the uniformity and density of the compact. The material is then vacuum sintered at high temperature to consolidate the tantalum and develop the required internal structure.
After sintering, the material can be processed by rolling and heat treatment according to the target specifications. CNC machining is used to achieve the required dimensions, tolerances, and surface condition.
The final target is inspected according to the applicable requirements. Depending on the order specification, inspection may include dimensions, surface condition, chemical composition, density, and other material characteristics.
For sputtering applications, the manufacturing process and material condition can be adjusted according to the required target size, purity, equipment, and application.
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Tantalum targets are used as a source material for depositing thin tantalum films. Typical applications include:
The required target purity and specifications can vary according to the deposition equipment and final application.
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
Quality Assurance and Testing
The tantalum material can be checked according to the applicable material specification before shipment.
Inspection may include:
Material certificates and inspection documents can be provided according to the order requirements.
For sputtering targets with specific density, grain size, microstructure, or bonding requirements, please provide the relevant technical specification before production.
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We specialize in custom solutions tailored to your unique requirements. From specific dimensions to specialized surface treatments, our experienced team works closely with you to develop the perfect solution.
Products are carefully packaged in protective materials to prevent contamination and damage. We coordinate international shipping to over 50 countries, ensuring safe delivery of your critical materials.
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Located in China's "Titanium Capital," we combine three decades of rare metal expertise with state-of-the-art manufacturing capabilities. Our founder's extensive industry experience ensures you receive knowledgeable support and reliable products.
We're committed to competitive pricing, on-time delivery, and customer-focused service. Trust our proven track record serving customers across the United States, Germany, South Korea, Singapore, and beyond.

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Q: What makes your tantalum targets suitable for semiconductor applications?
A: Our 99.95% purity and ≤50 ppm total impurities ensure contamination-free deposition critical for chip manufacturing.
Q: Can you provide custom dimensions?
A: Yes, we specialize in fully customized solutions to match your specific equipment and process requirements.
Q: What quality certifications do you provide?
A: We provide comprehensive test reports including purity analysis, microstructure evaluation, and dimensional measurements.
CHDY supplies tantalum targets and other tantalum products for customers in different industrial and technical applications.
The 99.95% tantalum target can be supplied according to the required dimensions, target shape, surface condition, and sputtering equipment requirements.
For a quotation, please provide:
We will check the material and production options based on your requirements.
Shaanxi Chuanghui Daye Metal Material Co., Ltd.
Address: Room 303, Block A, Lansi Science Park, 128 Gaoxin Avenue, High-tech Development Zone, Baoji City, Shaanxi Province, China.
Email: info@chdymetal.com
WhatsApp: +8618049386902
Business Hours: Monday – Saturday, 8:30 AM – 6:00 PM

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