99.95% tantalum target

1.Grade: Ta 1 Ta 2
2.Density:16.6 g/ cm 3
3.Purity : 99.95%min
4.size: customized
5.Condition: Vacuum Annealed
6.Surface: Alkaline wash surface / machined
7.Processing technic: CNC Milling Machinery
Product Description

 Product Introduction

99.95% tantalum target is a high-purity tantalum sputtering material used as a source material for thin-film deposition. Tantalum targets are used in electronic, semiconductor, coating, and other applications where a tantalum film is required.

The target can be supplied in different shapes and dimensions according to the sputtering equipment and application requirements. Purity, thickness, diameter, surface condition, and other specifications can be confirmed before production.

Properties of Tantalum

Tantalum has a high melting point, good chemical stability, and strong resistance to corrosion in many chemical environments. It also has good ductility and can be processed into different forms for industrial applications.

For sputtering applications, the purity and physical condition of the target are important factors. Target density, surface condition, dimensions, and microstructure may also need to be considered depending on the deposition process.

99.95% tantalum is suitable for applications where this level of material purity meets the customer's process requirements. Higher-purity tantalum targets can also be discussed when required.

Technical Specifications

Product name

high purity tantalum target

Application

Electronic Light Source Part;Implantation Parts.etc

Purity

99.95% Min

Density

16.65g/cm3

Surface

Polished and Black

Size

Φ2.0—100mm*L,customized

Chemical Composition

as below lists 

Melting point

3400℃

Packing

Wooden box

Production process

Tantalum raw material - electron beam vacuum melting - forging - polishing - inspection - delivery

Delivery time 

Normal time nees 7-12 working days 

Payment term

30%TT in advance, 70% balance payment before shipment

chemical composition

Grade

Chemical Composition (≤%)

Ta

Fe

Si

Ni

W

Mo

Ti

Nb

O

C

H

N

Ta1

Bal.

0.005

0.005

0.002

0.01

0.01

0.002

0.03

0.015

0.01

0.0015

0.01

Ta2

Bal.

0.03

0.02

0.005

0.04

0.03

0.005

0.1

0.02

0.01

0.0015

0.01

TaNb3

Bal.

0.03

0.03

0.005

0.04

0.03

0.005

<3.5

0.02

0.01

0.0015

0.01

TaNb20

Bal.

0.03

0.03

0.005

0.04

0.03

0.005

17.0-23.0

0.02

0.01

0.0015

0.01

Ta2.5W

Bal.

0.005

0.005

0.002

3.0

0.01

0.002

0.04

0.015

0.01

0.0015

0.01

Ta10W

Bal.

0.005

0.005

0.002

11

0.01

0.002

0.04

0.015

0.01

0.0015

0.01

Available Grades and Materials

We offer premium tantalum targets in multiple grades to match your specific requirements:

  • Ta-1 Grade: Ultra-high purity for semiconductor applications
  • Ta-2 Grade: High performance for general sputtering applications
  • Custom Compositions: Tailored alloys for specialized requirements

All grades undergo vacuum annealing treatment for optimal internal structure and performance consistency.

Manufacturing Process

The tantalum targets are produced using a powder metallurgy process. High-purity tantalum powder is first compacted to form the required billet or ingot.

Cold isostatic pressing can be used to improve the uniformity and density of the compact. The material is then vacuum sintered at high temperature to consolidate the tantalum and develop the required internal structure.

After sintering, the material can be processed by rolling and heat treatment according to the target specifications. CNC machining is used to achieve the required dimensions, tolerances, and surface condition.

The final target is inspected according to the applicable requirements. Depending on the order specification, inspection may include dimensions, surface condition, chemical composition, density, and other material characteristics.

For sputtering applications, the manufacturing process and material condition can be adjusted according to the required target size, purity, equipment, and application.

Annealing furnace Electron beam furnace Lathes Smelting equipment
Lathes Rolling machine Sawing machine Shearing Machine
Raw material inspection
Electron beam melting
titanium Melting
Forging
Titanium forging
Rolling 
Machining and forming
Machining and forming
Final inspection
Dimension inspection
packaging
Packaging

Applications and Industries

Tantalum targets are used as a source material for depositing thin tantalum films. Typical applications include:

  • Semiconductor and electronic components
  • Thin-film deposition
  • Diffusion barrier layers
  • Electronic device manufacturing
  • Vacuum coating
  • Research and laboratory applications
  • Specialized surface coating processes

The required target purity and specifications can vary according to the deposition equipment and final application.

 

Marine engineering

Electronic devices

Medical implants

Medical implants

Medical Equipment

Steel industry

Chemical Processing

Chemical Processing

Aerospace and Defense

Aerospace and Defense

Energy and Environmental Engineering

Energy and Environmental Engineering


Quality Assurance and Testing

 

The tantalum material can be checked according to the applicable material specification before shipment.

 

Inspection may include:

  • Chemical composition
  • Target dimensions
  • Surface condition
  • Appearance
  • Material condition
  • Other inspection requirements specified by the customer

Material certificates and inspection documents can be provided according to the order requirements.

For sputtering targets with specific density, grain size, microstructure, or bonding requirements, please provide the relevant technical specification before production.

certificate

certificate

OEM & Customization Services

We specialize in custom solutions tailored to your unique requirements. From specific dimensions to specialized surface treatments, our experienced team works closely with you to develop the perfect solution.

Packaging and Shipping

Products are carefully packaged in protective materials to prevent contamination and damage. We coordinate international shipping to over 50 countries, ensuring safe delivery of your critical materials.

Packaging Packaging Packaging

Packaging

Packaging

Packaging

Packaging

Packaging Packaging Packaging Packaging

Why Choose Us

Located in China's "Titanium Capital," we combine three decades of rare metal expertise with state-of-the-art manufacturing capabilities. Our founder's extensive industry experience ensures you receive knowledgeable support and reliable products.

We're committed to competitive pricing, on-time delivery, and customer-focused service. Trust our proven track record serving customers across the United States, Germany, South Korea, Singapore, and beyond.

Certificationimg-15-15

Certification Certification Certification Certification Certification Certification

FAQs

Q: What makes your tantalum targets suitable for semiconductor applications?

A: Our 99.95% purity and ≤50 ppm total impurities ensure contamination-free deposition critical for chip manufacturing.

Q: Can you provide custom dimensions?

A: Yes, we specialize in fully customized solutions to match your specific equipment and process requirements.

Q: What quality certifications do you provide?

A: We provide comprehensive test reports including purity analysis, microstructure evaluation, and dimensional measurements.

Contact Us

CHDY supplies tantalum targets and other tantalum products for customers in different industrial and technical applications.

The 99.95% tantalum target can be supplied according to the required dimensions, target shape, surface condition, and sputtering equipment requirements.

For a quotation, please provide:

  • Target size
  • Thickness
  • Purity
  • Quantity
  • Target shape
  • Bonding requirement, if applicable
  • Sputtering equipment or target drawing

We will check the material and production options based on your requirements.

Shaanxi Chuanghui Daye Metal Material Co., Ltd.
Address: Room 303, Block A, Lansi Science Park, 128 Gaoxin Avenue, High-tech Development Zone, Baoji City, Shaanxi Province, China.
Email: info@chdymetal.com
WhatsApp: +8618049386902
Business Hours: Monday – Saturday, 8:30 AM – 6:00 PM

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