tantalum sputtering target disc

1.Purity : 99.95%min
2.Size: customized
3.Condition: Vacuum Annealed
4.Surface: Alkaline wash surface / machined
5. Processing technic: CNC Milling Machinery
Product Description

High-Purity Tantalum Sputtering Target Disc for Precision Coating Applications

Looking for premium tantalum sputtering target disc solutions for your thin film deposition needs? Our precision-manufactured discs deliver exceptional performance in semiconductor and electronics manufacturing. With over 30 years of experience in rare metal processing, we provide high-purity tantalum targets that ensure consistent coating quality and superior film uniformity. Our tantalum sputtering target disc products meet strict industry standards for semiconductor chip manufacturing, display technology, and optical coating applications.

Product Introduction

Our tantalum target discs are engineered for professional sputtering systems. Each disc undergoes strict quality control to ensure optimal performance. We manufacture these products using advanced powder metallurgy techniques. This process creates uniform internal structures perfect for high-end applications. Our team combines decades of expertise with modern manufacturing methods to deliver reliable results every time.

Key Features and Benefits

  • Superior Purity: 99.95% minimum purity ensures excellent film quality
  • Precise Tolerances: Thickness tolerance of ±0.015 mm for consistent performance
  • High Density: ≥99.7% theoretical density provides stable plasma conditions
  • Excellent Flatness: ≤0.03 mm flatness enhances coating uniformity
  • Low Oxygen Content: ≤100 ppm oxygen improves electrical conductivity
  • Heat Resistance: Withstands up to 300 W/cm² heat load during operation

Technical Specifications

Parameter Specification
Material Grades Ta 1, Ta 2
Purity 99.95% minimum
Density 16.6 g/cm³
Diameter Range 75-200 mm
Thickness Tolerance ±0.015 mm
Flatness ≤0.03 mm
Oxygen Content ≤100 ppm
Heat Load Capacity 300 W/cm²
Deposition Rate 8-12 nm/s at 500W
Certificate  ISO 9001:2015
Delivery time  7-15 days mianly according to your quantity
Payment term 30%TT in advance, 70% balance before shipment

Chemcial composition

Grade

Chemical composition%, no more than

Fe

Si

Ni

W

Mo

Ti

Nb

O

C

H

N

Ta

Ta1

0.005

0.005

0.005

0.005

0.002

0.002

0.005

0.02

0.004

0.002

0.005

Balance

Ta2

0.005

0.005

0.005

0.005

0.002

0.002

0.1

0.03

0.1

0.002

0.01

Balance

Available Grades and Materials

We offer two primary tantalum grades to meet your specific requirements:

Ta 1 Grade: Higher purity option ideal for critical semiconductor applications

Ta 2 Grade: Cost-effective solution for general sputtering applications

Both grades undergo vacuum annealing treatment for optimal performance. Surface finishes include alkaline wash and precision machined options.

Manufacturing Process

Our manufacturing process starts with high-quality tantalum powder. We use cold isostatic pressing at pressures exceeding 200 MPa. The pressed material undergoes vacuum sintering at temperatures above 2400°C. This process creates fine, uniform internal structures without texture issues.

Rolling and heat treatment follow sintering. We control processing rates between 30-60% for optimal material properties. Final heat treatment occurs at 25-45% of tantalum's melting point. This careful process ensures consistent quality in every tantalum sputtering target disc.

Annealing furnace Electron beam furnace Lathes Smelting equipment
Lathes Rolling machine Sawing machine Shearing Machine
Raw material inspection
Electron beam melting
titanium Melting
Forging
Titanium forging
Rolling 
Machining and forming
Machining and forming
Final inspection
Dimension inspection
packaging
Packaging

Applications and Industries

Semiconductor Manufacturing: Essential for creating thin films in integrated circuits, capacitors, and resistors

Display Technology: Used in LCD and OLED manufacturing for electrodes and barrier layers

Optical Coatings: Perfect for enhancing transmittance and reducing reflection in optical products

Research and Development: Ideal for laboratory applications requiring high-purity materials

Be used in a wide range of industries.

 

Marine engineering

Electronic devices

Medical implants

Medical implants

Medical Equipment

Steel industry

Chemical Processing

Chemical Processing

Aerospace and Defense

Aerospace and Defense

Energy and Environmental Engineering

Energy and Environmental Engineering

Product Dimensions and Tolerances

We customize dimensions based on your sputtering system requirements. Standard diameters range from 75mm to 300mm. Thickness options vary according to your application needs. Our precision machining ensures tight tolerances for perfect system compatibility.

Quality Assurance and Testing

Every product undergoes comprehensive testing before shipment. We verify purity levels, dimensional accuracy, and surface quality. Our quality management system ensures consistent performance across all batches. Testing includes density measurements, chemical analysis, and visual inspection.

iso certificate

certificate

OEM & Customization Services

We welcome custom specifications for unique applications. Our engineering team works with you to develop optimal solutions. Whether you need special dimensions, surface treatments, or purity levels, we can accommodate your requirements. Contact us to discuss your specific needs.

Packaging and Shipping

Products ship in protective packaging to prevent contamination and damage. We use vacuum-sealed containers for sensitive applications. Our logistics team ensures safe delivery worldwide. We have successfully shipped to over 50 countries including the United States, Germany, South Korea, and Singapore.

Why Choose Us

Located in China's "Titanium Capital," we bring over three decades of rare metal expertise to every project. Our founder's extensive industry experience ensures you receive knowledgeable support and quality products. We focus on competitive pricing, on-time delivery, and customer satisfaction. Our commitment to continuous improvement means you benefit from the latest advances in tantalum sputtering target disc technology.

Certificationimg-15-15

Certification Certification Certification Certification Certification Certification

FAQs

Q: What makes your tantalum targets different from competitors?

A: Our powder metallurgy process creates superior internal uniformity without texture issues, ensuring consistent sputtering performance.

Q: Can you provide custom dimensions?

A: Yes, we manufacture targets to your exact specifications using precision CNC machining.

Q: What's the typical lead time for orders?

A: Standard products typically ship within 2-3 weeks. Custom orders may require additional time depending on specifications.

Q: Do you provide certificates of analysis?

A: Yes, every shipment includes detailed material certificates showing purity, composition, and test results.

Contact Us

Ready to enhance your thin film deposition processes? Contact our technical team today to discuss your tantalum sputtering target disc requirements. We're here to provide expert guidance and competitive solutions for your applications.

Email: info@chdymetal.com

Let us help you achieve superior coating results with our premium tantalum targets. Your success is our priority.

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