Looking for premium tantalum sputtering target disc solutions for your thin film deposition needs? Our precision-manufactured discs deliver exceptional performance in semiconductor and electronics manufacturing. With over 30 years of experience in rare metal processing, we provide high-purity tantalum targets that ensure consistent coating quality and superior film uniformity. Our tantalum sputtering target disc products meet strict industry standards for semiconductor chip manufacturing, display technology, and optical coating applications.
Our tantalum target discs are engineered for professional sputtering systems. Each disc undergoes strict quality control to ensure optimal performance. We manufacture these products using advanced powder metallurgy techniques. This process creates uniform internal structures perfect for high-end applications. Our team combines decades of expertise with modern manufacturing methods to deliver reliable results every time.
| Parameter | Specification |
|---|---|
| Material Grades | Ta 1, Ta 2 |
| Purity | 99.95% minimum |
| Density | 16.6 g/cm³ |
| Diameter Range | 75-200 mm |
| Thickness Tolerance | ±0.015 mm |
| Flatness | ≤0.03 mm |
| Oxygen Content | ≤100 ppm |
| Heat Load Capacity | 300 W/cm² |
| Deposition Rate | 8-12 nm/s at 500W |
| Certificate | ISO 9001:2015 |
| Delivery time | 7-15 days mianly according to your quantity |
| Payment term | 30%TT in advance, 70% balance before shipment |
Chemcial composition
|
Grade |
Chemical composition%, no more than |
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|
Fe |
Si |
Ni |
W |
Mo |
Ti |
Nb |
O |
C |
H |
N |
Ta |
|
|
Ta1 |
0.005 |
0.005 |
0.005 |
0.005 |
0.002 |
0.002 |
0.005 |
0.02 |
0.004 |
0.002 |
0.005 |
Balance |
|
Ta2 |
0.005 |
0.005 |
0.005 |
0.005 |
0.002 |
0.002 |
0.1 |
0.03 |
0.1 |
0.002 |
0.01 |
Balance |
Available Grades and Materials
We offer two primary tantalum grades to meet your specific requirements:
Ta 1 Grade: Higher purity option ideal for critical semiconductor applications
Ta 2 Grade: Cost-effective solution for general sputtering applications
Both grades undergo vacuum annealing treatment for optimal performance. Surface finishes include alkaline wash and precision machined options.
Our manufacturing process starts with high-quality tantalum powder. We use cold isostatic pressing at pressures exceeding 200 MPa. The pressed material undergoes vacuum sintering at temperatures above 2400°C. This process creates fine, uniform internal structures without texture issues.
Rolling and heat treatment follow sintering. We control processing rates between 30-60% for optimal material properties. Final heat treatment occurs at 25-45% of tantalum's melting point. This careful process ensures consistent quality in every tantalum sputtering target disc.
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Semiconductor Manufacturing: Essential for creating thin films in integrated circuits, capacitors, and resistors
Display Technology: Used in LCD and OLED manufacturing for electrodes and barrier layers
Optical Coatings: Perfect for enhancing transmittance and reducing reflection in optical products
Research and Development: Ideal for laboratory applications requiring high-purity materials
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
We customize dimensions based on your sputtering system requirements. Standard diameters range from 75mm to 300mm. Thickness options vary according to your application needs. Our precision machining ensures tight tolerances for perfect system compatibility.
Every product undergoes comprehensive testing before shipment. We verify purity levels, dimensional accuracy, and surface quality. Our quality management system ensures consistent performance across all batches. Testing includes density measurements, chemical analysis, and visual inspection.
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We welcome custom specifications for unique applications. Our engineering team works with you to develop optimal solutions. Whether you need special dimensions, surface treatments, or purity levels, we can accommodate your requirements. Contact us to discuss your specific needs.
Products ship in protective packaging to prevent contamination and damage. We use vacuum-sealed containers for sensitive applications. Our logistics team ensures safe delivery worldwide. We have successfully shipped to over 50 countries including the United States, Germany, South Korea, and Singapore.
Located in China's "Titanium Capital," we bring over three decades of rare metal expertise to every project. Our founder's extensive industry experience ensures you receive knowledgeable support and quality products. We focus on competitive pricing, on-time delivery, and customer satisfaction. Our commitment to continuous improvement means you benefit from the latest advances in tantalum sputtering target disc technology.

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Q: What makes your tantalum targets different from competitors?
A: Our powder metallurgy process creates superior internal uniformity without texture issues, ensuring consistent sputtering performance.
Q: Can you provide custom dimensions?
A: Yes, we manufacture targets to your exact specifications using precision CNC machining.
Q: What's the typical lead time for orders?
A: Standard products typically ship within 2-3 weeks. Custom orders may require additional time depending on specifications.
Q: Do you provide certificates of analysis?
A: Yes, every shipment includes detailed material certificates showing purity, composition, and test results.
Ready to enhance your thin film deposition processes? Contact our technical team today to discuss your tantalum sputtering target disc requirements. We're here to provide expert guidance and competitive solutions for your applications.
Email: info@chdymetal.com
Let us help you achieve superior coating results with our premium tantalum targets. Your success is our priority.
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