Looking for reliable pure niobium targets for your thin film deposition needs? Our premium-grade niobium sputtering targets deliver exceptional performance with 99.99% purity and ultra-low impurity levels. These high-quality materials ensure superior film uniformity and exceptional reliability for your most demanding applications. Whether you're working in semiconductor manufacturing, electronics, or research applications, our pure niobium targets provide the consistency and performance you need for successful project outcomes.
Our niobium targets offer outstanding characteristics that make them ideal for precision sputtering applications:
Chemical composition
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Material |
Main elements(%) |
Impurities (Maximum %) |
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Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Ta |
O |
C |
H |
N |
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RO4200 |
Remainder |
0.004 |
0.004 |
0.002 |
0.005 |
0.005 |
0.002 |
0.07 |
0.015 |
0.0040 |
0.0015 |
0.003 |
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RO4210 |
Remainder |
0.01 |
0.01 |
0.005 |
0.02 |
0.01 |
0.004 |
0.10 |
0.02 |
0.01 |
0.0015 |
0.01
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Niobium Round Bar Mechanical Properties
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Grade |
Tensile strength psi(MPa), ≥ |
Yield strength δ0.2, psi (MPa),≥ |
Elongation in 1"/2" gage length, %, ≥ |
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>=0.010 |
<0.010 |
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RO4200 RO4210 |
18000 (125) |
12000 (85) |
25 |
20 |
We offer industry-standard grades to meet your specific requirements:
All materials comply with ASTM B 392 standards ensuring consistent quality and performance.
Delivery time: stocks size will be within 1-5 days, normal production time need about 15 working days.
Payment terms: 30% TT in advance, 70% balance before payment.
Our advanced manufacturing process ensures optimal material properties. We start with high-purity niobium feedstock and employ precision machining techniques. Cold rolling processes create smooth surface finishes while maintaining structural integrity. Quality control measures monitor every production step to guarantee consistent results.
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Pure niobium targets serve diverse industries requiring high-performance thin films:
Electronic devices
Medical implants
Steel industry
Chemical Processing
Aerospace and Defense
Energy and Environmental Engineering
Your sputtering operations benefit from our targets' exceptional characteristics. The fine microstructure ensures uniform erosion patterns during sputtering. Low lattice defect levels (<0.05%) guarantee long-term reliability. Superior thermal conductivity enables stable operation at high power densities.
Every target undergoes comprehensive testing including:
We maintain strict quality standards throughout production to ensure consistent performance.
We understand your unique requirements. Our engineering team works with you to develop custom solutions including:
Your targets arrive safely with protective packaging designed for delicate materials. We use moisture-barrier materials and shock-resistant containers. Express shipping options ensure quick delivery to meet your project deadlines.
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Shaanxi Chuanghui Daye Metal Material Co., Ltd. brings over 30 years of rare metal expertise to your projects. Located in China's "Titanium Capital," we combine deep industry knowledge with modern manufacturing capabilities. Our commitment to quality and customer service has earned trust from clients across 50+ countries worldwide.

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Q: What purity levels are available for your niobium targets?
A: We offer standard 99.95% purity with ultra-low impurity levels suitable for most applications.
Q: Can you provide custom dimensions?
A: Yes, we manufacture targets to your specific size requirements with precise tolerances.
Q: What surface finishes do you offer?
A: We provide both cold-rolled and machined surfaces depending on your application needs.
Ready to enhance your thin film processes with premium pure niobium targets? Our technical team is here to help you select the right specifications for your application.
Contact us today: info@chdymetal.com
Let us provide you with reliable, high-quality sputtering materials that meet your exact requirements.

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